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CHEMFILM Used in Universal Laser Systems
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Two materials from CHEMFILM® high performance films have been qualified by Universal Laser Systems for laser processing applications. Universal Laser Systems selected CHEMFILM DF100 Cast PTFE Film and CHEMFILM ETFE-E2 Fluropolymer Film for laser processing experimentation to determine the best combination of optimal laser power and wavelength.
DF100 is a thin film that offers superior dielectric performance because of its multilayer construction. ETFE-2 is a general purpose ETFE film that is suitable for high temperature applications, up to 330°F. It offers high resistance to chemicals and weathering, as well as stress crack resistance, making it a perfect fit for laser processing.
Universal Laser Systems took samples of these materials and tested them with their laser material processing systems. After testing, it was determined that both materials proved successful in the laser cutting process.
To learn more, please visit the following case studies on USL’s website: